NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF SPACER, PRODUCTION METHOD OF PROTECTION FILM, AND LIQUID CRYSTAL DISPLAY DEVICE

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United States of America Patent

APP PUB NO 20180004086A1
SERIAL NO

15628630

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Abstract

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A negative photosensitive resin composition including an alkali-soluble resin (A), a compound (B) containing an ethylenically-unsaturated group, a photoinitiator (C), a solvent (D), and a silicone compound (E) is provided. The silicone compound (E) contains the structure represented by formula (E-1). The negative photosensitive resin composition has good sputtering resistance, by using the negative photosensitive resin composition, the issue of poor sputtering resistance of the spacer or a protective film formed by the negative photosensitive resin composition can be solved.

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Patent Owner(s)

Patent OwnerAddress
CHI MEI CORPORATION59-1 SAN CHIA JEN TE TAINAN CITY 71702

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, I-kuang New Taipei City, TW 3 2
Liao, Hao-Wei Kaohsiung City, TW 18 48

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