PROJECTION EXPOSURE DEVICE

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United States of America Patent

SERIAL NO

15542281

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Abstract

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A projection exposure device projects exposure light onto a substrate via a microlens array. The projection exposure device includes a scanning exposure unit that moves the microlens array along a scanning direction from one end toward another end of the substrate, and a microlens array shift unit that moves the microlens array in a shift direction intersecting with the scanning direction during movement of the microlens array caused by the scanning exposure unit.

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Patent Owner(s)

Patent OwnerAddress
V TECHNOLOGY CO LTDKANAGAWA KANAGAWA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mizumura, Michinobu Kanagawa, JP 113 613

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