Substrate processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10688622
APP PUB NO 20180001440A1
SERIAL NO

15615375

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A substrate processing apparatus is provided with a polishing part that polishes a substrate, a transporting part that transports a substrate before polishing to the polishing part, and a cleaning part that cleans the polished substrate. The cleaning part has a first cleaning unit and a second cleaning unit that are vertically arranged in two stages. The first cleaning unit and the second cleaning unit each have a plurality of cleaning modules that are arranged in series. The transporting part has a slide stage that is disposed between the first cleaning unit and the second cleaning unit, and transports a substrate before polishing along an arrangement direction of the plurality of cleaning modules.

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Patent Owner(s)

Patent OwnerAddress
EBARA CORPORATION11-1 HANEDA ASAHI-CHO OTA-KU TOKYO 1448510

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aono, Hiroshi Tokyo, JP 48 487
Hashimoto, Koichi Tokyo, JP 149 2010
Inaba, Mitsuhiko Tokyo, JP 12 24
Isobe, Soichi Tokyo, JP 22 181
Isokawa, Hidetatsu Tokyo, JP 9 25
Maeda, Koji Tokyo, JP 166 1614
Nakao, Hidetaka Tokyo, JP 11 138
Shimomoto, Hiroshi Tokyo, JP 12 70
Shinkai, Kenji Tokyo, JP 15 105
Yamaguchi, Kuniaki Tokyo, JP 47 303
Yashima, Tetsuya Tokyo, JP 5 36

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