Multi-laser system and method for cutting and post-cut processing hard dielectric materials

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United States of America Patent

PATENT NO 10807199
APP PUB NO 20180001425A1
SERIAL NO

15708628

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Abstract

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Laser processing of hard dielectric materials may include cutting a part from a hard dielectric material using a continuous wave laser operating in a quasi-continuous wave (QCW) mode to emit consecutive laser light pulses in a wavelength range of about 1060 nm to 1070 nm. Cutting using a QCW laser may be performed with a lower duty cycle (e.g., between about 1% and 15%) and in an inert gas atmosphere such as nitrogen, argon or helium. Laser processing of hard dielectric materials may further include post-cut processing the cut edges of the part cut from the dielectric material, for example, by beveling and/or polishing the edges to reduce edge defects. The post-cut processing may be performed using a laser beam with different laser parameters than the beam used for cutting, for example, by using a shorter wavelength (e.g., 193 nm excimer laser) and/or a shorter pulse width (e.g., picosecond laser).

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Patent Owner(s)

Patent OwnerAddress
IPG PHOTONICS CORPORATION377 SIMARANO DRIVE MARLBOROUGH MA 01752

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hannon, Mathew Bedford, US 10 179
Mendes, Marco Manchester, US 20 332
Sarrafi, Rouzbeh Fremont, US 7 71
Schoenly, Joshua Nashua, US 9 61
Sercel, Jeffrey P Hollis, US 39 683
Sokol, Miroslaw Bedford, US 13 147
Song, Xiangyang Acton, US 8 62

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