ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
N/A
app pub date -
Aug 4, 2016
filing date -
Jan 4, 2016
priority date (Note) -
Published
status (Latency Note)
![]() |
A preliminary load of PAIR data current through [] has been loaded. Any more recent PAIR data will be loaded within twenty-four hours. |
PAIR data current through []
A preliminary load of cached data will be loaded soon.
Any more recent PAIR data will be loaded within twenty-four hours.
![]() |
Next PAIR Update Scheduled on [ ] |

Importance

US Family Size
|
Non-US Coverage
|
Abstract
Disclosed are an array substrate, a manufacturing method thereof, and a display device. The array substrate includes a gate insulating layer, an active layer, source-drain electrodes, a first conductive layer and an isolation insulating layer), the source-drain electrodes are in contact with the active layer, the gate insulating layer is located on a surface of the active layer, the isolation insulating layer) is located on another surface of the active layer, and the isolation insulating layer at least includes a first hollow structure in a contacting region of the active layer and the source-drain electrodes; the isolation insulating layer is configured to isolate residue of the active layer located outside a region where the first hollow structure is located from contacting the first conductive layer.
First Claim
all claims..Other Claims data not available
Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
BOE TECHNOLOGY GROUP CO LTD | 100015 NO 10 JIUXIANQIAO ROAD BEIJING CHAOYANG DISTRICT BEIJING CITY BEIJING CITY 100015 | |
BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO LTD | 100176 NO 8 MIDDLE XIHUAN ROAD BEIJING ECONOMIC AND TECHNOLOGICAL DEVELOPMENT ZONE DAXING DISTRICT BEIJING BEIJING CITY BEIJING CITY 100176 |
International Classification(s)

- 2016 Application Filing Year
- H01L Class
- 27971 Applications Filed
- 23507 Patents Issued To-Date
- 84.05 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
LIN, Zijin | Beijing, CN | 11 | 14 |
# of filed Patents : 11 Total Citations : 14 | |||
PENG, Zhilong | Beijing, CN | 44 | 107 |
# of filed Patents : 44 Total Citations : 107 | |||
SUN, Dongjiang | Beijing, CN | 4 | 2 |
# of filed Patents : 4 Total Citations : 2 | |||
ZHAO, Haisheng | Beijing, CN | 31 | 46 |
# of filed Patents : 31 Total Citations : 46 |
Cited Art Landscape
- No Cited Art to Display

Patent Citation Ranking
- 0 Citation Count
- H01L Class
- 0 % this patent is cited more than
- 8 Age
Forward Cite Landscape
- No Forward Cites to Display

Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
---|---|---|---|---|
7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Jun 28, 2025 |
11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jun 28, 2029 |
Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge - 7.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge - 11.5 year - Late payment within 6 months | $160.00 | $80.00 | $40.00 |
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
Full Text

Legal Events

Matter Detail

Renewals Detail
