Interconnection structures and methods for making the same

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United States of America Patent

PATENT NO 10332861
APP PUB NO 20170373043A1
SERIAL NO

15683707

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Abstract

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The present disclosure provides a method for interconnecting components. First and second substrates are provided. First and second components are respectively provided on the first and second substrates, in which the second component is not in contact with the first component. Then, a joint component is formed between the first and second components by passing a flow of a fluid comprising ions of a conductive material between the first and second components and electrolessly plating the first and second components by the conductive material so that the joint component is electrically connected between the first and second components. The present disclosure also provides related interconnection structures and a fixture for forming a related microchannel structure.

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Patent Owner(s)

Patent OwnerAddress
NATIONAL TAIWAN UNIVERSITYNO 1 SEC 4 ROOSEVELT ROAD TAIPEI 10617

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Yan-Bin Taipei, TW 6 29
Hung, Han-Tang Taipei, TW 12 8
Kao, Cheng-Heng Taipei, TW 10 63
Yang, Chun-Hsiang Taipei, TW 43 60

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