Negative Capacitance Field Effect Transistor

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United States of America Patent

SERIAL NO

15183352

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Abstract

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A gate structure of a negative capacitance field effect transistor (NCFET) is disclosed. The NCFET includes a gate stack disposed over a substrate. The gate stack includes a dielectric material layer, a ferroelectric ZrO2 layer and a first conductive layer. The NCFET also includes a source/drain feature disposed in the substrate adjacent the gate stack.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78
NATIONAL TAIWAN UNIVERSITYNO 1 SEC 4 ROOSEVELT ROAD TAIPEI 10617

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Miin-Jang Taipei, TW 66 230
Lin, Bo-Ting Taichung City, TW 11 50
Liu, Chi-Wen Hsinchu, TW 285 7442

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