Wide bandgap field effect transistors with source connected field plates

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United States of America Patent

PATENT NO 11664429
APP PUB NO 20170365670A1
SERIAL NO

15696050

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Abstract

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A field effect transistor comprising a buffer and channel layer formed successively on a substrate. A source electrode, drain electrode, and gate are all formed in electrical contact with the channel layer, with the gate between the source and drain electrodes. A spacer layer is formed on at least a portion of a surface of the channel layer between the gate and drain electrode and a field plate is formed on the spacer layer isolated from the gate and channel layer. The spacer layer is electrically connected by at least one conductive path to the source electrode, wherein the field plate reduces the peak operating electric field in the device.

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Patent Owner(s)

Patent OwnerAddress
WOLFSPEED INC4600 SILICON DRIVE DURHAM NC 27703

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mishra, Umesh Montecito, US 97 5252
Moore, Marcia Santa Barbara, US 15 1120
Parikh, Primit Goleta, US 78 4576
Wu, Yifeng Goleta, US 156 6838

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