EPITAXIAL SUBSTRATE

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United States of America Patent

SERIAL NO

15591716

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Abstract

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A GaN epitaxial substrate comprises a growth substrate and a multilayer structure grown on the growth substrate in the Ga-polar direction. The multilayer structure comprises: a buffer layer, an n-type conductive layer formed on the buffer layer, a first GaN layer formed on the n-type conductive layer, an electron supply layer formed on the first GaN layer, and a second GaN layer formed on the electron supply layer.

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Patent Owner(s)

Patent OwnerAddress
ADVANTEST CORPORATION1-6-2 MARUNOUCHI CHIYODA-KU TOKYO 100-0005

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
SATO, Taku Tokyo, JP 26 161

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