Chemical mechanical polishing (CMP) of cobalt-containing substrate

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10745589
APP PUB NO 20170362466A1
SERIAL NO

15615236

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

Chemical mechanical polishing (CMP) compositions, methods and systems for polish cobalt or cobalt-containing substrates are provided. The CMP compositions comprise α-alanine, abrasive particles, a salt of phosphate, corrosion inhibitor, oxidizer and water. The cobalt chemical mechanical polishing compositions provide high removal rate of Co as well as very high selectivity of Co film vs. dielectric film, such as TEOS, SixNy (with 1.0

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
VERSUM MATERIALS US LLC8555 SOUTH RIVER PARKWAY TEMPE AS 85284

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Clore, Timothy Joseph Chandler, US 1 7
Grief, Malcolm Phoenix, US 27 731
O'Neill, Mark Leonard Queen Creek, US 111 11126
Rose, Joseph Chandler, US 12 36
Schlueter, James Allen Phoenix, US 21 108
Shi, Xiaobo Chandler, US 87 369

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
7.5 Year Payment $3600.00 $1800.00 $900.00 Feb 18, 2028
11.5 Year Payment $7400.00 $3700.00 $1850.00 Feb 18, 2032
Fee Large entity fee small entity fee micro entity fee
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00