Lithographic apparatus and device manufacturing method
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United States of America Patent
Stats
-
Jun 25, 2019
Grant Date -
Dec 14, 2017
app pub date -
Aug 28, 2017
filing date -
Aug 19, 2004
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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International Classification(s)
- 2017 Application Filing Year
- G03F Class
- 2105 Applications Filed
- 1552 Patents Issued To-Date
- 73.73 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- G03F Class
- 0 % this patent is cited more than
- 6 Age
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| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Dec 25, 2026 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Dec 25, 2030 |
