Polishing composition, polishing method, and method for manufacturing ceramic component

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United States of America Patent

PATENT NO 10626297
SERIAL NO

15538432

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Abstract

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Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives, has a pH of 6.0 or more to 9.0 or less, and is used for polishing ceramic.

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Patent Owner(s)

Patent OwnerAddress
FUJIMI INCORPORATED1-1 CHIRYO 2-CHOME NISHIBIWAJIMA-CHO KIYOSU-SHI AICHI 452-5802

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Asai, Maiko Aichi, JP 18 26
Asano, Hiroshi Aichi, JP 131 976
Hishida, Shota Aichi, JP 5 4
Ikedo, Tomoya Aichi, JP 2 4
Ito, Yuuichi Aichi, JP 11 30
Otsuki, Shingo Aichi, JP 6 10
Tamai, Kazusei Aichi, JP 43 339

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