Polymer, negative resist composition, and pattern forming process
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Aug 13, 2019
Grant Date -
Dec 14, 2017
app pub date -
May 16, 2017
filing date -
Jun 8, 2016
priority date (Note) -
In Force
status (Latency Note)
Importance
Loading Importance Indicators... 
Abstract
A polymer comprising recurring units derived from vinylanthraquinone, recurring units containing a benzene ring having a hydroxyl-bearing tertiary alkyl group bonded thereto, and recurring units derived from hydroxystyrene is provided. The polymer is used as a base resin to formulate a negative resist composition having a high resolution and minimal LER.
First Claim
Other Claims data not available
Family
Loading Family data...
International Classification(s)
- 2017 Application Filing Year
- C08F Class
- 2524 Applications Filed
- 1863 Patents Issued To-Date
- 73.82 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- C08F Class
- 0 % this patent is cited more than
- 6 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Feb 13, 2027 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Feb 13, 2031 |
