FIELD EFFECT TRANSISTOR AND SENSOR USING SAME

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United States of America Patent

SERIAL NO

15501991

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Abstract

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A field effect transistor and a sensor using the field effect transistor is provided. The field effect transistor can be manufactured so as to have uniform properties by simple steps at low costs, and can stably detect, when used as a sensor, a very small amount of analyte with a high sensitivity while the properties are hardly deteriorated. A channel of the field effect transistor is constituted by a single-walled carbon nanotube thin film that is grown, by a chemical vapor deposition method, using particles of a nonmetallic material as growth nuclei, the nonmetallic material containing 500 mass ppm or less metallic impurities that contain a metal and its compounds.

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Patent Owner(s)

Patent OwnerAddress
NIPPON KAYAKU KABUSHIKI KAISHA1-1 MARUNOUCHI 2-CHOME CHIYODA-KU TOKYO 1000005
OSAKA UNIVERSITYSUITA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ARIFUKU, Michiharu Tokyo, JP 7 38
KASE, Hiroto Osaka, JP 7 7
KIYOYANAGI, Noriko Tokyo, JP 17 55
KOBAYASHI, Yoshihiro Osaka, JP 153 1041
MORINO, Tomio Tokyo, JP 8 18
NEGISHI, Ryota Osaka, JP 3 13

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