Multisurface simultaneous sputtering and shuttering
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 15, 2020
Grant Date -
Dec 7, 2017
app pub date -
May 31, 2017
filing date -
Jun 3, 2016
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A deposition system comprises a vacuum chamber having a cylindrical inner wall, a cylindrical parts carousel disposed concentrically inside the cylindrical inner wall of the vacuum chamber, and one or more deposition sources arranged to flow deposition material onto the cylindrical parts carousel. A cylindrical shutter assembly is disposed concentrically inside the cylindrical inner wall of the vacuum chamber, and has (1) a shuttered position in which the cylindrical shutter assembly blocks the one or more deposition sources from depositing onto the parts carousel and (2) an unshuttered position in which the cylindrical shutter assembly does not block the one or more deposition sources from depositing onto the parts carousel. A drive train rotates the cylindrical shutter assembly between the shuttered and unshuttered positions. The drive train not operatively connected to rotate the cylindrical parts carousel. The deposition sources may include inner and outer sputter sources.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2017 Application Filing Year
- C23C Class
- 3339 Applications Filed
- 2148 Patents Issued To-Date
- 64.34 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- C23C Class
- 0 % this patent is cited more than
- 5 Age
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