POLYDISPERSE LARGE-PARTICLE-SIZE SILICA SOL AND METHOD OF PREPARING THE SAME

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United States of America Patent

SERIAL NO

15219533

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The present disclosure provides a polydispersion large-particle-size silica sol and a method of preparing the same. The polydispersion large-particle-size silica sol is mainly used as a polishing solution to enhance a polishing rate. The preparing method prepares the silica sol by stirring and heating a monodisperse spherical silica sol with a particle size of 20 nm-30 nm which is taken as a seed crystal, and meanwhile constantly adding, by drops, the seed crystal of the monodisperse spherical silica sol with a particle size of 20 nm-30 nm and active silicic acid into a reaction system, wherein during the whole reaction process, a heating concentration method is adopted to maintain a constant liquid level and during this period, inorganic dilute alkali solution is added by drops to maintain the pH value of the system between 9.5 and 10.5; cooling is performed after heat preservation. With the silica sol prepared according to the present disclosure, the polishing rate can be effectively enhanced, and meanwhile, occurrences of scratches can be reduced.

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Patent Owner(s)

Patent OwnerAddress
SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY CHINESE ACADEMY OF SCIENCES200050 NO 865 CHANGNING ROAD SHANGHAI CHANGNING DISTRICT SHANGHAI CITY SHANGHAI CITY 200050
SHANGHAI XINANNA ELECTRONIC TECHNOLOGY CO LTDBUILDING 6 HENGXIN TECHNOLOGY INDUSTRY GARDEN ALLEY 285 TIANGONG ROAD JINSHAN INDUSTRIAL PARK SHANGHAI 201506

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kong, Hui Shanghai, CN 4 0
Liu, Weili Shanghai, CN 13 176
Song, Zhitang Shanghai, CN 31 358

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