Fabrication of M-plane Gallium Nitride

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United States of America Patent

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15241810

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The present disclosure provides a fabrication of M-plane gallium nitride which is able to grow M-plane gallium nitride without the need of expensive substrates, such as LiAlO2, LiGaO2 or SiC. The fabrication of M-plane gallium nitride includes preparing a zinc oxide hexagonal prism having a growth face, and growing a gallium nitride layer on the growth face of the zinc oxide hexagonal prism. The growth face is an M-plane perpendicular to a direction of gravity.

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NATIONAL SUN YAT-SEN UNIVERSITYNO 70 LIEN-HAI RD GUSHAN DISTRICT KAOHSIUNG CITY

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Inventor Name Address # of filed Patents Total Citations
Lo, I-Kai Kaohsiung, TW 15 21
Tsai, Jenn-Kai Kaohsiung, TW 2 3
You, Shuo-Ting Kaohsiung, TW 1 0

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