CHEMICAL FOR PHOTOLITHOGRAPHY WITH IMPROVED LIQUID TRANSFER PROPERTY AND RESIST COMPOSITION COMPRISING THE SAME
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United States of America Patent
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Aug 4, 2017
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Apr 20, 2015
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A method of forming a pattern, the method including exposing under KrF excimer laser beams, a chemical for photolithography coated through spin coating, including a resin ingredient having a mass-average molecular weight (Mw) of 2000 to 50000 and an organic solvent having a saturated vapor pressure of 1 kPa or more (1 atm, 20° C.) and a viscosity of 1.1 cP (1 atm, 20° C.) or less.
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