FABRIC HAVING UNEVEN-SURFACE DESIGN, AND METHOD FOR PRODUCING SAME

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United States of America Patent

SERIAL NO

15533225

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Abstract

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Provided is a fabric to which an uneven-surface design which is fine and has flexibility and wear resistance is imparted. The fabric has a polyurethane resin applied portion on at least a portion of a surface side of the fabric, and an uneven-surface design shaped on the polyurethane resin applied portion. The polyurethane resin applied portion is a region in which a polyurethane resin which is applied is present, and the polyurethane resin permeates between the fibers at least in a surface portion of the fabric such that a surface of the fabric is formed by the polyurethane resin and the fibers. In the polyurethane resin applied portion, an application depth of the polyurethane resin is 50 to 200 μm, a filling ratio of the polyurethane resin is 15% to 45%, and a filling ratio of the fibers of the fabric is 50% to 80%.

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Patent Owner(s)

Patent OwnerAddress
SEIREN CO LTD10-1 KEYA 1-CHOME FUKUI-SHI FUKUI 9188560

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KAWAMURA, Kazunori Fukui-shi, Fukui, JP 29 204

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