Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces

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United States of America Patent

PATENT NO 10755901
APP PUB NO 20170338083A1
SERIAL NO

15532845

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Abstract

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The present invention relates generally to a plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction for deposition of thin film coatings and modification of surfaces. More particularly, the present invention relates to a plasma source comprising one or more plasma-generating electrodes, wherein a macro-particle reduction coating is deposited on at least a portion of the plasma-generating surfaces of the one or more electrodes to shield the plasma-generating surfaces of the electrodes from erosion by the produced plasma and to resist the formation of particulate matter, thus enhancing the performance and extending the service life of the plasma source.

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Patent Owner(s)

Patent OwnerAddress
AGC FLAT GLASS NORTH AMERICA INC11175 CICERO DRIVE SUITE 400 ALPHARETTA GA 30022-1167
ASAHI GLASS CO LTDTOKYO TOKYO METROPOLIS
AGC GLASS EUROPEBELGIUM LEUVEN FLEMISH BRABANT

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chambers, John San Francisco, US 32 312
Johnson, Herb Kingsport, US 9 220
Lin, Yuping Alpharetta, US 37 507
Maschwitz, Peter Sebastopol, US 24 861

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