STATIC THERMAL CHEMICAL VAPOR DEPOSITION WITH LIQUID PRECURSOR
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United States of America Patent
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Nov 23, 2017
app pub date -
May 18, 2017
filing date -
May 23, 2016
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Abstract
Static thermal chemical vapor deposition treatment processes and static thermal chemical vapor deposition treatment systems are disclosed. The process includes providing an enclosed chamber configured to produce a material on a surface of an article within the enclosed chamber in response thermal energy being applied to a gaseous precursor, providing a liquid handling system in selective fluid communication with the enclosed chamber, flowing a liquid precursor through the liquid handling system, converting the liquid precursor to the gaseous precursor, and producing the material on the surface of the article in response to the thermal energy being applied to the gaseous precursor within the enclosed chamber. The system includes the enclosed chamber and the liquid handling system.
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