Ion implantation process and ion implanted glass substrates
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United States of America Patent
Stats
-
Jul 7, 2020
Grant Date -
Nov 23, 2017
app pub date -
Oct 21, 2015
filing date -
Oct 24, 2014
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The invention concerns a process for increasing the scratch resistance of a glass substrate by implantation of simple charge and multicharge ions, comprising maintaining the temperature of the area of the glass substrate being treated at a temperature that is less than or equal to the glass transition temperature of the glass substrate, selecting the ions to be implanted among the ions of Ar, He, and N, setting the acceleration voltage for the extraction of the ions at a value comprised between 5 kV and 200 kV and setting the ion dosage at a value comprised between 1014 ions/cm2 and 2.5×1017 ions/cm2.The invention further concerns glass substrates comprising an area treated by implantation of simple charge and multicharge ions according to this process and their use for reducing the probability of scratching on the glass substrate upon mechanical contact.
First Claim
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International Classification(s)
- 2015 Application Filing Year
- C23C Class
- 3009 Applications Filed
- 2118 Patents Issued To-Date
- 70.39 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 1 Citation Count
- C23C Class
- 58.45 % this patent is cited more than
- 5 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Jan 7, 2028 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jan 7, 2032 |
