Memory structure and manufacturing method for the same
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
N/A
app pub date -
Oct 11, 2016
filing date -
May 4, 2016
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A memory structure and a manufacturing method for the same are disclosed. The memory structure comprises memory segments. Each of the memory segments comprises a memory array region, a memory selecting region adjacent to the memory array region, a semiconductor gate electrode, a semiconductor channel connecting to the semiconductor gate electrode, a gate dielectric layer, a gate electrode layer, and channel layer. The gate electrode layer and the semiconductor channel are in the memory selecting region. The gate electrode layer and the semiconductor channel are separated from each other by the gate dielectric layer. The channel layer and the semiconductor gate electrode are in the memory array region. The channel layer and the semiconductor gate electrode are separated from each other by the gate dielectric layer.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully