MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

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United States of America Patent

SERIAL NO

15657624

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT AGRUDOLF-EBER-STRASSE 2 OBERKOCHEN 73447

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Feldmann, Heiko Aalen, DE 77 442
Gruner, Toralf Aalen-Hofen, DE 173 1727
Kamenov, Vladimir Essingen, DE 30 118
Kraehmer, Daniel Essingen, DE 59 660
Pazidis, Alexandra Essingen-Lauterburg, DE 29 463
Six, Stephan Aalen, DE 16 79
Thome, Bruno Aalen, DE 6 36
Weissenrieder, Karl-Stefan Elchingen, DE 10 68
Zirkel, Achim Muenchen, DE 8 10

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