Submicron particle removal from gas streams
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United States of America Patent
Stats
-
Aug 4, 2020
Grant Date -
Nov 9, 2017
app pub date -
Apr 24, 2017
filing date -
May 9, 2016
priority date (Note) -
In Force
status (Latency Note)
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Abstract
Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).
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International Classification(s)
- 2017 Application Filing Year
- C05C Class
- 107 Applications Filed
- 65 Patents Issued To-Date
- 60.75 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- C05C Class
- 0 % this patent is cited more than
- 5 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Feb 4, 2028 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Feb 4, 2032 |
