Pattern inspection apparatus
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United States of America Patent
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Jan 16, 2018
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app pub date -
Apr 26, 2017
filing date -
Apr 28, 2016
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Abstract
A pattern inspection apparatus includes a column to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams, a stage to mount the substrate thereon and to be movable, a detector to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams, and a drive mechanism to move the detector in order to follow movement of the stage.
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