METHOD FOR MANUFACTURING NITRIDE CRYSTAL SUBSTRATE AND SUBSTRATE FOR CRYSTAL GROWTH

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United States of America Patent

APP PUB NO 20170314157A1
SERIAL NO

15584756

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Abstract

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A high-quality nitride crystal substrate is manufactured, using a substrate for crystal growth with its diameter enlarged, the nitride crystal substrate including: a first step of preparing a substrate for crystal growth having a plurality of seed crystal substrates made of nitride crystals, arranged in a planar appearance, so that their main surfaces are parallel to each other and their lateral surfaces are in contact with each other, and a difference of a lattice constant between adjacent seed crystal substrates arbitrarily selected from a plurality of the seed crystal substrates is within 7×10−5 Å; and a second step of growing a crystal film on a ground surface belonging to the substrate for crystal growth.

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Patent Owner(s)

Patent OwnerAddress
SUMITOMO CHEMICAL COMPANY LIMITED2-7-1 NIHONBASHI CHUO-KU TOKYO 103-6020
OSAKA UNIVERSITYSUITA
SCIOCS COMPANY LIMITED880 ISAGOZAWA-CHO HITACHI-SHI IBARAKI 319-1418

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
IMADE, Mamoru Suita-shi, JP 15 73
IMANISHI, Masayuki Suita-shi, JP 73 690
MORI, Yusuke Suita-shi, JP 205 925
SHIBATA, Masatomo Hitachi-shi, JP 46 745
YOSHIDA, Takehiro Hitachi-shi, JP 305 2730
YOSHIMURA, Masashi Suita-shi, JP 93 643

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