CVD or PVD reactor for coating large-area substrates
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United States of America Patent
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Nov 3, 2020
Grant Date -
Nov 2, 2017
app pub date -
Nov 18, 2015
filing date -
Nov 20, 2014
priority date (Note) -
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Abstract
A CVD or PVD coating device comprises a housing and a gas inlet organ secured to the housing via a retaining device, the gas inlet organ having a gas outlet surface with gas outlet openings. The retaining device is only secured at its horizontal edge to the housing so as to stabilize the retaining device with respect to deformations and temperature. The gas inlet organ is secured, at a plurality of suspension points, to the retaining device by means of a plurality of hanging elements distributed over the entire horizontal surface of the retaining device. The retaining device has mechanical stabilization elements formed by a retaining frame having vertical walls that are interconnected at vertical connection lines. An actively cooled heat shield is situated between the retaining device and the gas inlet organ.
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