Etching agent for semiconductor substrate

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United States of America Patent

PATENT NO 10106736
APP PUB NO 20170306229A1
SERIAL NO

15520468

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention relates to an alkaline etching agent for treating a surface of a semiconductor substrate for solar cells, containing at least one hydroxystyrene polymer represented by the general formula (1) and an alkaline agent. According to the present invention, some effects are exhibited that the texture formation is made possible to a semiconductor substrate for solar cells at relatively lower temperatures with a shorter amount of time, thereby having excellent productivity.

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Patent Owner(s)

  • SETTSU OIL MILL., INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akagi, Seimei Sakai, JP 1 0
Kamada, Yoshiteru Osaka, JP 1 0
Moriwaki, Kazuhiro Osaka, JP 2 0
Ohyagi, Noboru Osaka, JP 1 0
Saida, Toshinori Sakai, JP 3 0
Yamamoto, Yuzo Izumisano, JP 64 679

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