RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

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United States of America Patent

SERIAL NO

15642908

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Abstract

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A radiation-sensitive composition includes an organic acid, particles including a metal oxide as a principal component, and an acid generating agent that is capable of generating an acid upon irradiation with a radioactive ray. A pKa, which is a logarithmic value of a reciprocal of an acid dissociation constant Ka, of the acid generated from the acid generating agent is less than a pKa of the organic acid. The acid generating agent satisfies at least one of conditions (i) and (ii): (i) a van der Waals volume of the acid is no less than 2.1×10−28 m3; and (ii) the acid generating agent includes a plurality of groups that are capable of generating an acid.

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Patent Owner(s)

Patent OwnerAddress
JSR CORPORATION1-9-2 HIGASHI-SHINBASHI MINATO-KU TOKYO 105-8640

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
NAKAGAWA, Hisashi Tokyo, JP 46 351
NARUOKA, Takehiko Tokyo, JP 47 211
SHIRATANI, Motohiro Tokyo, JP 23 69

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