Shower head, vapor phase growth apparatus and vapor phase growth method
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United States of America Patent
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Feb 16, 2021
Grant Date -
Oct 19, 2017
app pub date -
Apr 13, 2017
filing date -
Apr 19, 2016
priority date (Note) -
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Abstract
A shower head that supplies a process gas in a vapor phase growth apparatus includes a mixing chamber; and a plurality of cooling portions provided below the mixing chamber with gaps between cooling portions. The cooling portion includes a cooling hole provided in a horizontal direction, and the gaps extend linearly in the horizontal direction. The shower head further includes, below the gaps, a plurality of buffer regions extending linearly in the horizontal direction. The shower head further includes, below the buffer regions, a shower plate including a plurality of through holes disposed at a predetermined interval. The shower head can uniformly supply the process gas.
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