COMBINED ANNEAL AND SELECTIVE DEPOSITION SYSTEMS
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United States of America Patent
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Oct 19, 2017
app pub date -
Apr 18, 2016
filing date -
Apr 18, 2016
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Abstract
A system and a method for forming a film with an annealing step and a deposition step is disclosed. The system performs an annealing step for inducing self-assembly or alignment within a polymer. The system also performs a selective deposition step in order to enable selective deposition on a polymer.
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