LITHOGRAPHY SYSTEM WITH DIFFERENTIAL INTERFEROMETER MODULE

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United States of America Patent

SERIAL NO

15620699

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Abstract

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The invention relates to a lithography system comprising an optical column, a moveable target carrier for displacing a target such as a wafer, and a differential interferometer module, wherein the interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to an interferometer module and method for measuring such a displacement and rotations.

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ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Couweleers, Godefridus Cornelius Antonius Delft, NL 9 47
de, Boer Guido Leerdam, NL 42 242
Ooms, Thomas Adriaan Delfgauw, NL 4 25
Vergeer, Niels Rotterdam, NL 22 152

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges216962105211977532301 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8091 - 100100 +05010015020025030035040045050055060065070075080085090095010001050

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