Gas jetting apparatus for film formation apparatus

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United States of America Patent

PATENT NO 10676825
APP PUB NO 20170275758A1
SERIAL NO

15514367

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Abstract

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The gas jetting apparatus according to the present invention includes a gas jetting cell unit for rectifying a gas and jetting the rectified gas into the film formation apparatus. The gas jetting cell unit has a fan shape internally formed with a gap serving as a gas route. A gas in a gas dispersion supply unit enters from a wider-width side of the fan shape into the gap, and, due to the fan shape, the gas is rectified, accelerated, and output from a narrower-width side of the fan shape into the film formation apparatus.

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Patent Owner(s)

Patent OwnerAddress
TMEIC CORPORATION1-1 KYOBASHI 3-CHOME CHUO-KU TOKYO 104-0031

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nishimura, Shinichi Tokyo, JP 91 745
Tabata, Yoichiro Tokyo, JP 48 1363
Watanabe, Kensuke Tokyo, JP 46 174

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