Method for balancing consumption of targets in pulsed dual magnetron sputtering (DMS) processes
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United States of America Patent
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Jun 25, 2019
Grant Date -
Sep 21, 2017
app pub date -
May 30, 2017
filing date -
Jul 17, 2013
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Abstract
A sputtering system and method are disclosed. The system has at least one dual magnetron pair having a first magnetron and a second magnetron, each magnetron configured to support target material. The system also has a DMS component having a DC power source in connection with switching components and voltage sensors. The DMS component is configured to independently control an application of power to each of the magnetrons, and to provide measurements of voltages at each of the magnetrons. The system also has one or more actuators configured to control the voltages at each of the magnetrons using the measurements provided by the DMS component. The DMS component and the one or more actuators are configured to balance the consumption of the target material by controlling the power and the voltage applied to each of the magnetrons, in response to the measurements of voltages at each of the magnetrons.
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