REACTION SYSTEM AND USING METHOD THEREOF

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20170269096A1
SERIAL NO

15462920

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Abstract

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A reaction system comprises at least one additive and at least one reaction base-plane for augmenting chemical reaction, photoelectrochemical reaction, photochemical reaction or electrochemical reaction. The reaction system further comprises at least one reaction substrate carried out to the chemical reaction, the photoelectrochemical reaction, the photochemical reaction or the electrochemical reaction with the at least one additive and the at least one reaction base-plane. The at least one additive is a kind of reaction enhancer added in the reaction system to improve, augment or accumulate the effeteness of at least one reaction result.

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Patent Owner(s)

Patent OwnerAddress
NATIONAL CHENG KUNG UNIVERSITYNO 1 DAXUE RD EAST DIST TAINAN CITY 701
NATIONAL CHENG KUNG UNIVERSITY HOSPITALNO 138 SHENGLI RD NORTH DIST TAINAN CITY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHEN, HAI-WEN Tainan, TW 35 482
CHEN, LIANG-CHE Tainan, TW 4 2
CHUNG, CHUNG-JEN Tainan, TW 22 101
CHUNG, WEI-PANG Tainan, TW 4 7
HUANG, WEI-LUN Tainan, TW 37 431
SU, WU-CHOU Tainan, TW 12 8
TENG, CHIAO-YI Tainan, TW 3 3
TENG, HSISHENG Tainan, TW 16 6
YEH, TE-FU Tainan, TW 9 24
YEH, YU-MIN Tainan, TW 2 2

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