Pre-patterned lithography templates, processes based on radiation patterning using the templates and processes to form the templates
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United States of America Patent
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May 12, 2020
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Sep 14, 2017
app pub date -
Mar 10, 2017
filing date -
Mar 11, 2016
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Abstract
High etch contrast materials provide the basis for using pre-patterned template structure with a template hardmask having periodic holes and filler within the holes that provides the basis for rapidly obtaining high resolution patterns guided by the template and high etch contrast resist. Methods are described for performing the radiation lithography, e.g., EUV radiation lithography, using the pre-patterned templates. Also, methods are described for forming the templates. The materials for forming the templates are described.
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