COMPOSITION FOR FORMING RESIN THIN FILM FOR HYDROFLUORIC ACID ETCHING AND RESIN THIN FILM FOR HYDROFLUORIC ACID ETCHING

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Jul 30, 2015
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Jul 30, 2014

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Abstract

The invention provides a resin-thin-film-forming composition employed in hydrofluoric acid etching, which composition contains a hydrogenated polybutadiene compound having a (meth)acrylic group and a radical polymerization initiator.

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Patent Owner	Address
NISSAN CHEMICAL INDUSTRIES LTD	TOKYO JAPAN TOKYO METROPOLIS

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Inventor Name	Address	# of filed Patents	Total Citations
SATO, Tetsuo	Funabashi-shi, Chiba, JP	95	662

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COMPOSITION FOR FORMING RESIN THIN FILM FOR HYDROFLUORIC ACID ETCHING AND RESIN THIN FILM FOR HYDROFLUORIC ACID ETCHING

Number of patents in Portfolio can not be more than 2000

United States of America Patent

15329928

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15329928

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