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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
DUPONT ELECTRONIC MATERIALS INTERNATIONAL LLC	455 FOREST STREET MARLBOROUGH MA 01752

International Classification(s)

• C08F:MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONL....
• C07C:ACYCLIC OR CARBOCYCLIC COMPOUNDS
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Aqad, Emad	Northborough, US	70	229
Cameron, James F	Brookline, US	111	1077
Thackeray, James W	Braintree, US	102	1785

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
7.5 Year Payment	$3600.00	$1800.00	$900.00	Feb 28, 2025
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Feb 28, 2029

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

Full Text

US Patent Application No: 2017/0248,844

PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE USING THE PHOTORESIST COMPOSITION

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