Charged particle beam drawing apparatus and charged particle beam drawing method
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United States of America Patent
Stats
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Dec 26, 2017
Issued Date -
N/A
app pub date -
Feb 8, 2017
filing date -
Feb 23, 2016
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
In one embodiment, A charged particle beam drawing apparatus includes an irradiation amount resetting processing circuitry changing the irradiation amount in the shot data to the irradiation amount lower limit value when the irradiation amount defined in the shot data is less than the irradiation amount lower limit value, a shot size adjustment processing circuitry changing the shot size defined in the shot data, based on an amount of the change in the irradiation amount, a shot position adjustment processing circuitry changing the shot position defined in the shot data, based on an amount of the change in the shot size, and a drawing device drawing a pattern by irradiating the substrate with the charged particle beam, using the shot data in which the irradiation amount, the shot size, and the shot position have been changed.
First Claim
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International Classification(s)
- 2017 Application Filing Year
- H01J Class
- 2316 Applications Filed
- 1735 Patents Issued To-Date
- 74.92 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H01J Class
- 0 % this patent is cited more than
- 8 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Jun 26, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jun 26, 2029 |
