PHASE SHIFT MASK AND MANUFACTURING METHOD THEREOF
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United States of America Patent
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Issued Date -
Aug 24, 2017
app pub date -
Apr 21, 2016
filing date -
Feb 19, 2016
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Abstract
A phase shift mask including a substrate, a phase shift layer and a transparent layer is provided. The phase shift layer is disposed on the substrate and has an opening. The transparent layer is disposed in the opening. The phase shift mask can have a large DOF window.
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