PE-ALD METHODS WITH REDUCED QUARTZ-BASED CONTAMINATION
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United States of America Patent
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app pub date -
Jan 27, 2017
filing date -
Feb 22, 2016
priority date (Note) -
Published
status (Latency Note)
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Abstract
Methods of performing PE-ALD on a substrate with reduced quartz-based contamination are disclosed. The methods include inductively forming in a quartz plasma tube a hydrogen-based plasma from a feed gas that consists essentially of either hydrogen and nitrogen or hydrogen, argon and nitrogen. The nitrogen constitutes 2 vol % or less of the feed gas. The hydrogen-based plasma includes one or more reactive species. The one or more reactive species in the hydrogen-based plasma are directed to the substrate to cause the one or more reactive species to react with a initial film on the substrate. The trace amounts of nitrogen serve to reduce the amount of quartz-based contamination in the initial film as compared to using no nitrogen in the feed gas.
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