MANUFACTURING METHOD FOR COMPONENT IN PLASMA PROCESSING APPARATUS

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United States of America Patent

SERIAL NO

15586577

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Abstract

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A manufacturing method for a component in a plasma processing apparatus is provided. The method includes: performing a surface conditioning on a surface of an underlying layer on which a film is to be formed by thermal spraying, the surface of the underlying layer includes a surface of a base or a surface of a layer formed on the surface of the base; and forming the film on the surface of the underlying layer by thermally spraying yttrium fluoride. A high velocity oxygen fuel spraying method or an atmospheric plasma spraying method is used in the forming of the film.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO
TOCALO CO LTD4-4 6-CHOME MINATOJIMAMINAMI-MACHI CHUO-KU KOBE-SHI HYOGO 650-0047

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Abukawa, Shikou Akashi, JP 5 11
Kanazawa, Yoshinori Funabashi, JP 31 86
Mitsuhashi, Koji Kurokawa-gun, JP 6 16
Nagai, Masaya Funabashi, JP 19 82
Nagayama, Nobuyuki Kurokawa-gun, JP 57 1551
Niya, Tetsuya Funabashi, JP 3 261

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