METHOD FOR PLATING PVD GERM REPELLENT FILM
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United States of America Patent
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Aug 10, 2017
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Jan 20, 2017
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Feb 4, 2016
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Disclosed is method for plating a PVD (physical vapor deposition) germ killing film, employing a vacuum magnetron sputtering technology and using a nano-silver-containing target for uniformly distributing nano-silver to form a germ killing film. The method can achieve the aim of full germ killing. Besides, nano-silver is enveloped in the sputtering target to form the film, so the target material target can play the role of protecting the nano-silver. Target material can be Al, Cr, stainless steel and Cu. Therefore, the nano-silver is protected; wear resistance of the germ killing film is increased; and the germ killing film can continuously kills germs for a long time.
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