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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
HITACHI CHEMICAL COMPANY LTD	1-1 NISHI-SHINJUKU 2-CHOME SHINJUKU-KU TOKYO 163-0449
SHANGHAI JIAO TONG UNIVERSITY	800 DONGCHUAN ROAD MINHANG DISTRICT SHANGHAI 200240

International Classification(s)

• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....
• B32B:LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
EBIHARA, Masahiko	Chiyoda-ku, Tokyo, JP	7	21
JIANG, Xuesong	Minhang District, Shanghai, CN	21	77
MURAKAMI, Yasuharu	Chiyoda-ku, Tokyo, JP	24	60
OOTA, Emiko	Chiyoda-ku, Tokyo, JP	5	11

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
7.5 Year Payment	$3600.00	$1800.00	$900.00	Feb 3, 2025
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Feb 3, 2029

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

Full Text

US Patent Application No: 2017/0219,923

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE FILM, PATTERN SUBSTRATE, PHOTOSENSITIVE CONDUCTIVE FILM, AND CONDUCTIVE PATTERN SUBSTRATE

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