EXPOSURE APPARATUS
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United States of America Patent
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Issued Date -
Jul 27, 2017
app pub date -
Jan 26, 2017
filing date -
Jan 27, 2016
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
An exposure apparatus includes a light source, an illumination optical system, a mask, and a projection optical system. The mask is configured from a plurality of small masks individually formed from small patterns in a plurality of regions into which a pattern to configure one device is divided. The projection optical system is configured in a size corresponding to a size of the small masks and projecting the small patterns in a reduced scale on a substrate. The necessity for a projection optical system for which accuracy against aberration is demanded and a high-price lens is used is eliminated, and it is possible to use a projection optical system configured from a small-sized lens having a small projection area and less liable to be influenced by aberration. Consequently, the exposure apparatus can be provided at a reduced cost.
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Patent Citation Ranking
- 1 Citation Count
- G03F Class
- 21.07 % this patent is cited more than
- 8 Age