DIFFUSION-RATE-LIMITED THERMAL CHEMICAL VAPOR DEPOSITION COATING

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United States of America Patent

SERIAL NO

15004455

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Abstract

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Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The article includes a substrate and a thermal chemical vapor deposition coating on the substrate. The thermal chemical vapor deposition coating includes properties from being produced by diffusion-rate-limited thermal chemical vapor deposition. The thermal chemical vapor deposition process includes introducing a gaseous species to a vessel and producing a thermal chemical vapor deposition coating on an article within the vessel by a diffusion-rate-limited reaction of the gaseous species.

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Patent Owner(s)

Patent OwnerAddress
SILCOTEK CORP225 PENN TECH DRIVE BELLEFONTE PA 16823

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CONDO, Steven A Mill Hall, US 1 1
DESKEVICH, Nicholas Peter Hollidaysburg, US 5 4
MATTZELA, James B Port Matilda, US 22 149
SILVIS, Paul H Port Matilda, US 23 235
VEZZA, Thomas F State College, US 7 38

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