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United States of America Patent
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app pub date -
Sep 28, 2015
filing date -
Sep 29, 2014
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Abstract
An orthosis 1 includes: an outer layer 2 which maintains a substantially elliptic shape; and a buffer 3 provided on the inner periphery of the outer layer 2, and buffers predetermined sites on the head. When the orthosis 1 is worn deviating from a state where the minor axis of the substantially elliptic shape corresponds to the width of the head, pressers 24a, 24b are formed which press the predetermined sites on the head with a stronger force than a force before deviation. The outer layer 2 includes adjustment portions 23a and 23b which can be close or apart in the minor axis direction of the substantially elliptic shape. The orthosis 1 further includes an adjuster 4 which adjusts the adjustment portions 23a, 23b so that the length of the minor axis of the substantially elliptic shape can correspond to the width of the head.
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