IMPRINT TEMPLATE AND METHOD FOR PRODUCING THE SAME

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United States of America Patent

SERIAL NO

15476446

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Abstract

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An imprint template is used for photocuring imprinting, and includes a support plate that is transparent with respect to an exposure wavelength used for photocuring imprinting, and has flexibility; a buffer resin layer that is formed on the support plate, and is formed of an elastic material that is transparent with respect to the exposure wavelength; and a resin film mold that is removably bonded to the buffer resin layer, and is transparent with respect to the exposure wavelength, wherein a concave-convex transfer pattern is formed on a surface of the resin film mold.

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Patent Owner(s)

Patent OwnerAddress
ZEON CORPORATIONTOKYO
TOYAMA PREFECTURE1-7 SHINSOUGAWA TOYAMA-SHI TOYAMA 930-0006
KYORITSU CHEMICAL & CO LTD1-2-2 UCHISAIWAI-CHO CHIYODA-KU TOKYO 100-0011

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
AONO, Tomoshi Chiba, JP 1 7
KASHIWAGI, Motofumi Tokyo, JP 13 146
KUCHIKI, Mikiharu Tokyo, JP 2 7
NASUNO, Masaaki Toyama, JP 1 7
OBATA, Tsutomu Toyama, JP 37 232
YOKOYAMA, Yoshiyuki Toyama, JP 43 479

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