Systems and methods for modifying material substrates
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United States of America Patent
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Apr 7, 2020
Grant Date -
Jul 13, 2017
app pub date -
Mar 24, 2017
filing date -
Feb 11, 2013
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Abstract
A system includes a computing device that generates at least one process script for the modification to a material substrate and at least one pattern script that corresponds to the process script. The computing device also merges the process script with the pattern script and generates a plurality of command signals that are based on the merged process and pattern scripts. An energy source generates a plurality of light beams based on the generated command signal(s). At least one modulating component modulates the generated light beams based on generated command signal(s). A waveform apparatus generates at least one waveform signal to customize the generated light beams based on the generated command signal(s). A motion control apparatus controls at least one parameter of the light beams based on the generated command signal(s).
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